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1 article(s) from Fischer, Fabian

Growth, structure and stability of sputter-deposited MoS₂ thin films

Reinhard Kaindl,
Bernhard C. Bayer,
Roland Resel,
Thomas Müller,
Viera Skakalova,
Gerlinde Habler,
Rainer Abart,
Alexey S. Cherevan,
Dominik Eder,
Maxime Blatter,
Fabian Fischer,
Jannik C. Meyer,
Dmitry K. Polyushkin and
Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

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Figure 1: (a) SEM and (b) AFM images of MoS₂ thin films (≈100 nm) deposited at RT and 400 °C. (c) Ex situ Ram...

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Figure 2: XRR pattern of MoS₂ thin films (≈10 nm) deposited at RT and 400 °C. X-ray wavelength λ = 0.1518 nm.

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Figure 3: (a) Specular XRD patterns of MoS₂ films (≈10 nm) deposited at RT and 400 °C. (b,c) GIXD images of M...

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Figure 4: (a) In situ laser annealing Raman spectra of MoS₂ thin films, deposited at RT (bottom panel) and 40...

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Figure 5: Drain–source currents measured versus the (a) drain–source and the (b) gate-voltage for a 10 nm MoS₂...

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Figure 6: Electrochemical HER measurements on our PVD MoS₂ films directly on SiO₂ covered Si substrates.

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Figure 7: Current generated per area of the uncoated and coated electrodes over time. The currents have been ...

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Figure 8: Average current density generated per uncoated and coated electrodes during the 2 h experiments. Th...

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Figure 9: Average hydroxide (OH–) moles produced during the 2 h experiments.

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Full Research Paper

Published 22 May 2017

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Growth, structure and stability of sputter-deposited MoS2 thin films

Growth, structure and stability of sputter-deposited MoS₂ thin films